The Reactive Plasma Processing (RPP) activity in PLF at Risø DTU is dealing with advanced plasma-assisted, aided or enhanced technologies for etching, sputtering, deposition, implantation, ashing, cleaning, surface roughening, oxidation, surface activation, passivation or bio-inactivation.
Research expertise
- Development and characterization of plasma sources (capacitively and inductively coupled, surface wave, electron cyclotron resonance, magnetron sputtering, dielectric barrier discharge, micro-discharge)
- Ion focusing and mass spectrometry by three dimensional plasma sheath lenses
- Thin and ultra thin film deposition
- Plasma immersion ion implantation
- Plasma sterilization and bio-inactivation
- Plasma assisted molecular beam epitaxy
- Plasma diagnostics (probes, mass spectrometry, optical emission spectroscopy)
- NOx reduction by low temperature oxidation with ozone
Members
Eugen Stamate, PhD, Senior Scientist
Jess Thorsen, research technician
Former members
Dr. Weifeng Chen, current affiliation: Canadian Light Source Inc.
Dr. Mihai Draghici, current affiliation: Infineon Technologies
Facilities
- Plasma immersion ion implantation based on matrix ECR plasma source
- Inductively coupled plasma reactor
- DC/RF magnetron sputtering
- RF sputtering
- Positive and negative ion source
Plasma assisted molecular beam epitaxy with Auger Electron Spectroscopy - Dielectric barrier discharge
- Mass spectrometer, optical spectrograph with CCD, Langmuir probes
Direct collaborators
Alexander Fateev, Senior Scientist,
PLF - Optical Diagnostics
Silvia Alina Chiper, PhD, Al. I. Cuza, Iasi, Romania
Current research projects
- PLasTEP: Plasma technologies for environment
- NOx/SOx reduction
- Baltic Sea Programme 2007-2013 Interregional IV project.
- Plasma Sheath Lens
Collaborations
Plasma Nanotechnology Research Center, Nagoya University, Japan
LPSC-CNRS, J Fourier University, Grenoble, France
Plasma and materials processing, Eindhoven University of Technology, Eindhoven, Nederland
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